XSIGNO - Digitale Photogrammetrie

Titel

Ort

Resolution Enhancement Techniken in der Halbleiterlithographie. (Folien)

Kolloquium Uni Erlangen

Mask diffraction at conical offaxis illumination. (Folien)

3rd IISB Litho Workshop

Titel

Ort

Fourier analysis of AIMS images for mask characterization. (Poster, Paper)

Photomask Japan

First results from AIMS beta tool for 157nm Lithography. (Paper)

SPIE

Aerial image based mask defect detection
in dense array structures. (Poster, Paper)

Photomask Japan

Thema

Diplomand

Fast Resist Modeling
for Semiconductor Lithography. (Thesis)

Rongfeng Shi,
Tongji University

Optimization Tool Development for
Lithographic Imaging. (Thesis)

Bernd Küchler,
IT University of Göteborg